XUUS – Coherent EUV and Soft X-ray Source

From the pioneer in robust, engineered EUV systems
Good news: you no longer have to dedicate your laboratory resources to building a high harmonic generation (HHG) system. The 5th generation of KMLabs’ XUUS™ extreme UV ultrafast source is a turnkey system that gets you right into your experiment. XUUS5 is a coherent EUV/soft X-ray light source based on high harmonic generation. It is a fully-engineered and integrated commercial source based on a single robust opto-mechanical platform.


KMLabs is the pioneer in introducing robust, engineered coherent EUV systems to the market. The eXtreme Ultraviolet Ultrafast Source (XUUS5™) is their 5th generation instrument that upconverts ultrafast laser pulses into the Extreme UV (EUV) or soft X-ray regions of the spectrum. Employing HHG processes, the output beam inherits the coherent properties of a driving laser such as the KMLabs RAEA with wavelengths that can be tuned from ~10 to 47 nm. Moreover, customized systems can generate coherent beams with wavelengths as short as 6.5 nm. XUUS5 employs KMLabs’ patented hollow waveguide for the high harmonic up-conversion process.


  • Patented high harmonic conversion in a waveguide for optimum conversion, stability, and robustness.
  • EUV flux can exceed > 1×1012 ph/sec, for the most demanding applications
  • Ultrastable, 4-axis active stabilization of the beam, generating an EUV beam intensity and wavefront stability comparable to visible-IR lasers
  • High average power handling capability driving next generation experiments
  • Diagnostic cameras for performance monitoring and alignment control
  • Graphical, intuitive software control
  • Stable, industrial optical mounting on a temperature-stabilized platform
  • A growing family of application-specific beamlines delivering photons tailored to your experiment
  • Highly coherent, laser-like EUV (XUV) / SXR
  • Custom XUUS systems to generate soft X-rays to wavelengths ~6 nm
  • Waveguide design allows efficient use of high-pressure gas with minimum gas usage:1000x less than a gas jet geometry and up to 100x greater efficiency
  • XUUS output can be optimized for different applications: ARPES, imaging, transient absorption, MOKE, XMCD

WavelengthFlux*Repetition RatePointing StabilityPower Stability
30 nm>5x1012 ph/sec per harmonic1 - 20<5 µrad RMS<5% RMS
13 nm>1010 ph/sec per harmonic1 - 10<5 µrad RMS<5% RMS
6 nm>106 ph/sec per 10% BW1<10 µrad RMS<10% RMS
* Achievable when optimally coupled to KMLabs RAEA(TM) Ti:sapphire amplifier. Performance will vary with other driving lasers.

View / download the datasheet

In recent work published in Nature Photonics, Dennis Gardner and colleagues from the Murnane/Kapteyn group at JILA used the KMLabs XUUS4TM as a light source to achieve the 1st sub-wavelength EUV imaging for any light source, small or large. They also demonstrated coherent imaging of near-periodic samples with record 12.6 nm spatial resolution, at the technologically significant wavelength of 13.5 nm. The use of coherent EUV beams to implement coherent diffractive imaging has made it possible for the first time to advance EUV and x-ray imaging to near its theoretical resolution limit. To read more see: “Sub-wavelength coherent imaging of periodic samples using a 13.5 nm tabletop high harmonic light source,” Nature Photonics 11, 259 (2017). doi:10.1038/nphoton.2017.33.

Wide Field-of-View Reflection-Mode Ptychographic Imaging Microscope with Tabletop 12.7 nm High Harmonic Illumination

Other applications this product can be used for:

  • Metrology for nanoelectrics and in support of EUV lithography
  • High-resolution and time-resolved lensless nanoimaging
  • Ultrafast magnetic materials & spintronics studies
  • Photoemission: tr-ARPES & attosecond materials science
  • High spatial and temporal resolution pump-probe studies of magnetic, materials, molecular, and nanosystems dynamics
  • Molecular dynamics and attosecond science

View the KM Labs CLEO webinar on EUV laser technology and semiconductor applications here.

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