XUUS – Coherent EUV and Soft X-ray Source

From the pioneer in robust, engineered EUV systems
Good news: you no longer have to dedicate your laboratory resources to building a high harmonic generation (HHG) system. The 5th generation of KMLabs’ XUUS™ extreme UV ultrafast source is a turnkey system that gets you right into your experiment. XUUS5 is a coherent EUV/soft X-ray light source based on high harmonic generation. It is a fully-engineered and integrated commercial source based on a single robust opto-mechanical platform.

Description

KMLabs is the pioneer in introducing robust, engineered coherent EUV systems to the market. The eXtreme Ultraviolet Ultrafast Source (XUUS5™) is their 5th generation instrument that upconverts ultrafast laser pulses into the Extreme UV (EUV) or soft X-ray regions of the spectrum. Employing HHG processes, the output beam inherits the coherent properties of a driving laser such as the KMLabs RAEA with wavelengths that can be tuned from ~10 to 47 nm. Moreover, customized systems can generate coherent beams with wavelengths as short as 6.5 nm. XUUS5 employs KMLabs’ patented hollow waveguide for the high harmonic up-conversion process.

Features:

  • Patented high harmonic conversion in a waveguide for optimum conversion, stability, and robustness.
  • EUV flux can exceed > 1×1012 ph/sec, for the most demanding applications
  • Ultrastable, 4-axis active stabilization of the beam, generating an EUV beam intensity and wavefront stability comparable to visible-IR lasers
  • High average power handling capability driving next generation experiments
  • Diagnostic cameras for performance monitoring and alignment control
  • Graphical, intuitive software control
  • Stable, industrial optical mounting on a temperature-stabilized platform
  • A growing family of application-specific beamlines delivering photons tailored to your experiment
  • Highly coherent, laser-like EUV (XUV) / SXR
  • Custom XUUS systems to generate soft X-rays to wavelengths ~6 nm
  • Waveguide design allows efficient use of high-pressure gas with minimum gas usage:1000x less than a gas jet geometry and up to 100x greater efficiency
  • XUUS output can be optimized for different applications: ARPES, imaging, transient absorption, MOKE, XMCD

WavelengthFlux*Repetition RatePointing StabilityPower Stability
30 nm>5x1012 ph/sec per harmonic1 - 20<5 µrad RMS<5% RMS
13 nm>1010 ph/sec per harmonic1 - 10<5 µrad RMS<5% RMS
6 nm>106 ph/sec per 10% BW1<10 µrad RMS<10% RMS
* Achievable when optimally coupled to KMLabs RAEA(TM) Ti:sapphire amplifier. Performance will vary with other driving lasers.

View / download the datasheet

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