Imagine Optic’s HASO EUV wavefront sensor, developed in collaboration with the LOA and the SOLEIL synchrotron, is the only device of its kind available that offers you the extreme precision and direct measurement functionality needed for today’s demanding laboratory and industrial applications.
Designed and built in collaboration with our customers and with their needs as the top priority, the HASO EUV incorporates our patented rotated square technology to offer high spatial sampling and wide dynamic range, making it the ideal choice for HHG, EUV lithography, synchrotron and EUV-FEL beam analysis. When used for adaptive optics, the EUV becomes a powerful tool for that provides you with micro and nano-beam focusing, a high Strehl ratio and precise control of the focal spot shape.
When combined with our powerful and easy-to-use software packages, you can easily conduct wavefront acquisition and reconstruction. Additional add-on modules offer features including extended wavefront reconstruction and Point Spread Function (PSF), as well as a dynamic library that enables you to build your own software applications using this remarkable device.
- Working wavelength range from 4 to 45 nm, see the specification table below
- High resolution
- Large aperture
- Vacuum compatible
- Perfectly adapted for laboratory and industrial applications
- Independent phase and intensity measurements
- High-Numerical Aperture (NA) model now available
|Property||HASO EUV||HASO EUV High NA|
|Aperture dimension||13 x 13 mm²||D = 20 mm|
|Number of Sub-apertures||72 x 72||110 across diameter|
|Curvature dynamic range||0.5 m to ∞ (diverging)||0.1 m to ∞|
|Repeatability (rms)||~ λ/200||~ λ/200|
|Wavefront measurement accuracy in absolute mode (rms)*||λ/50 @ 13.5 nm||~ λ/50 @ 30 nm|
|Wavefront measurement accuracy in relative mode (rms)**||~ λ/100 @13.5 nm||< λ/100 @ 30 nm|
|Tilt measurement sensitivity (rms)||0.05 μrad||0.1 μrad|
|Minimum readout time||about 600 ms (@2 MHz digitization)||~ 2s|
|Spatial beam sampling step||~180 μm||~150 μm|
|Working photon energy (wavelength)***||30 eV – 300 eV (4 nm – 40 nm)||27.6-124eV (10 nm – 45 nm)|
|Calibrated wavelength||user specific||user specific|
|Length||270 mm||170 mm|
|Compliant vacuum (hydrocarbon free, compatible with clean vacuum)||10^-7 mbar||down to 10^-6 mbar
(requires dynamic vacuum)
|Interface / Power supply||USB 2.0 / Included||USB 2.0 / Included|
|Sensor Type||Vacuum Interface||In vacuum|
|Operating system||Windows 7||Windows 7|
|WaveView metrology software||Included||Included|
*Wavefront as seen by the device.
** Difference between the real wavefront and a reference wavefront obtained in similar conditions (5λ of shift max).
***Calibration ensured inside this range. Sensor may be used outside of this range.